ASTM F 1845 Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Resolution Glow Discharge Mass Spectrometer
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ASTM F 1845 Document Information:
Title
Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Resolution Glow Discharge Mass Spectrometer
ASTM International
Publication Date:
Dec 10, 1997
Scope:
This test method determines the concentrations of trace metallic
impurities in high purity (99.99
wt. % pure, or purer, with respect to metallic trace impurities)
aluminum-copper, aluminum-silicon
and aluminum-copper-silicon alloys with major alloy constituents as
follows:
This test method pertains to analysis by magnetic-sector glow
discharge mass spectrometer (GDMS).
This test method does not include all the information needed to
complete GDMS analyses.
Sophisticated computer-controlled laboratory equipment, skillfully
used by an experienced operator,
is required to achieve the required sensitivity. This test method does
cover the particular factors
(for example, specimen preparation, setting of relative sensitivity
factors, determination of
detection limits, etc.) known by the responsible technical committee
to effect the reliability of
high purity aluminum analyses.
This standard does not purport to address all of the safety concerns,
if any, associated with its
use. It is the responsibility of the user of this standard to
establish appropriate safety and
health practices and determine the applicability of regulatory
limitations prior to use.
Keywords:
- aluminum
- aluminum-copper alloys
- aluminum-copper-silicon alloys
- aluminum-silicon alloys
- electronics
- glow discharge mass spectrometer (GDMS)
- purity analysis
- sputtering target
- trace metallic impurities
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