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ASTM D 5544 Document Information:
Title
Standard Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water
ASTM International
Publication Date:
Jan 1, 2005
Scope:
This test method covers the determination of dissolved organic and
inorganic matter and colloidal
material found in high-purity water used in the semiconductor, and
related industries. This
material is referred to as residue after evaporation (RAE). The range
of the test method is from
0.01 µg/L(ppb) to 20 mg/L (ppm).
This test method uses a continuous, real time monitoring technique to
measure the concentration of
RAE. A pressurized sample of high-purity water is supplied to the test
method's apparatus
continuously through ultra-clean fittings and tubing. Contaminants
from the atmosphere are
therefore prevented from entering the sample. General information on
the test method and a
literature review on the continuous measurement of RAE has been
published.(Footnote 2)
The values stated in SI units are to be regarded as the standard. The
values given in parentheses
are for information only.
This standard does not purport to address all of the safety concerns,
if any, associated with its
use. It is the responsibility of the user of this standard to
establish appropriate safety and
health practices and determine the applicability of regulatory
limitations prior to use. For
specific hazards statements, see Section 8.
Footnote 2 - Blackford, D. B., and Kerrick, T. A., Proceeding of
Microcontamination '91, San Jose,
CA, 1991, pp. 39-51. Published by Canon Communications Inc., 3340
Ocean Park Blvd., Suite 1000,
Santa Monica, CA 90405.
Keywords:
- high-purity water
- nonvolatile residue
- residue after evaporation
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